HITACHI HD2000   扫描电子显微镜

The HD-2000 has been introduced in response to the need for evaluation and analysis of ultra-thin sections in semiconductor applications

The HD-2000 has been introduced in response to the need for evaluation and analysis of ultra-thin sections in semiconductor applications. Using TEM technology, the HD-2000 offers high resolution of 0.24 nm and a maximum magnification of 2 million times, yet offers the simplicity of operation of an SEM. The HD-2000 offers a fast sample throughput: between 20 and 30 times faster than a conventional TEM. The HD-2000 can be equipped with an energy dispersive X-ray spectrometer and can also be used in conjunction with the FB-2000A focused ion beam system, to offer a comprehensive investigation and analysis capability. A digital imaging system allows direct measurement of the key parameters from the image display. The HD-2000 can be fully networked to allow transfer of images wherever they are required.

• Z-contrast transmitted electron image
• Windows - based user interface
• Sample throughput 20-30 times faster than a conventional TEM
• Optional phase-contrast transmitted electron image
• Small footprint. Room size required: 4 x 5 metres